Electro-chemical mechanical polishing of single-crystal SiC using CeO2 slurry
نویسندگان
چکیده
منابع مشابه
Chemical Mechanical Polishing by Colloidal Silica Slurry
Chemical Mechanical Polishing is a unique process enabling technology that allows chip makers to readily drive lithographic patterning steps to smaller dimensions, an ages old, “retro” technology related to glass polishing and metallographic finishing, thus enabling optical lithography to work. It represents a situation that is a true paradigm shift from the typical way in which technological a...
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ژورنال
عنوان ژورنال: Electrochemistry Communications
سال: 2015
ISSN: 1388-2481
DOI: 10.1016/j.elecom.2015.01.002